140. CONTROL OF EXTREME ULTRAVIOLET LIGHT GENERATION VIA INFINITE DIMENSIONAL BACKSTEPPING
Name: Stephen Chen
Grad Year: 2018
Extreme ultraviolet light (EUV) has applications in lithography for advanced chip manufacturing. Generating the EUV can be accomplished through vaporizing liquid tin droplets and thusly releasing the proper wavelength. However, the vaporization also introduces disturbances which affect consequent events. The vaporization procedure generates a shock which propagates and displaces the following droplets, which in turn reduces the intensity of the light generated. The process can be modeled by a coupled first-order hyperbolic partial differential equation (PDE) with a boundary reaction term given by an ordinary differential equation (ODE). The model is presented, stability is studied, and an infinite dimensional backstepping feedback control law developed to achieve exponential stability properties.
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